发明名称 WAFER BONDING TECHNIQUES TO MINIMIZE BUILT-IN STRESS OF SILICON MICROSTRUCTURES AND MICRO-MIRRORS
摘要 A bonded wafer fabrication mechanism for a micro-mirror structure provides for oxidizing a device wafer instead of a handle wafer or splitting thermal oxidation processing between the device wafer and the handle wafer prior to etching. The flatness of mirrors in micro-mirror structures fabricated according to such a mechanism is substantially improved.
申请公布号 WO0154176(A9) 申请公布日期 2003.01.16
申请号 WO2001US01758 申请日期 2001.01.18
申请人 XROS, INC., NORTEL NETWORKS;SLATER, TIMOTHY, G. 发明人 SLATER, TIMOTHY, G.
分类号 H01L21/20;H01L21/762;(IPC1-7):H01L21/20 主分类号 H01L21/20
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