发明名称 |
WAFER BONDING TECHNIQUES TO MINIMIZE BUILT-IN STRESS OF SILICON MICROSTRUCTURES AND MICRO-MIRRORS |
摘要 |
A bonded wafer fabrication mechanism for a micro-mirror structure provides for oxidizing a device wafer instead of a handle wafer or splitting thermal oxidation processing between the device wafer and the handle wafer prior to etching. The flatness of mirrors in micro-mirror structures fabricated according to such a mechanism is substantially improved.
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申请公布号 |
WO0154176(A9) |
申请公布日期 |
2003.01.16 |
申请号 |
WO2001US01758 |
申请日期 |
2001.01.18 |
申请人 |
XROS, INC., NORTEL NETWORKS;SLATER, TIMOTHY, G. |
发明人 |
SLATER, TIMOTHY, G. |
分类号 |
H01L21/20;H01L21/762;(IPC1-7):H01L21/20 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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