发明名称 |
Enhanced remote plasma cleaning |
摘要 |
Methods and apparatus for cleaning semiconductor processing equipment. The apparatus include both local and remote gas dissociators coupled to a semiconductor processing chamber to be cleaned. The methods include introducing a precursor gas into the remote dissociator where the gas is dissociated and introducing a portion of the dissociated gas into the chamber. Another portion of the dissociated gas which re-associates before introduction into the chamber is also introduced into the chamber where it is again dissociated. The dissociated gas combines with contaminants in the chamber and is exhausted from the chamber along with the contaminants.
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申请公布号 |
US2003010355(A1) |
申请公布日期 |
2003.01.16 |
申请号 |
US20010905515 |
申请日期 |
2001.07.13 |
申请人 |
APPLIED MATERIALS, INC |
发明人 |
NOWAK THOMAS;LATCHFORD IAN;TANAKA TSUTOMU;KIM BOK H.;XU PING;FOSTER JASON;DESHONG HEATH B.;SEAMONS MARTIN |
分类号 |
B08B7/00;C23C16/44;C23C16/52;H01J37/32;(IPC1-7):B08B9/00;B08B7/04 |
主分类号 |
B08B7/00 |
代理机构 |
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代理人 |
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