发明名称 |
Optical system with a plurality of optical elements |
摘要 |
An optical system, in particular an exposure lens for semiconductor lithography, with a plurality of optical elements has at least one load-dissipating structure. The load-dissipating structure diverts the forces originating from the optical elements. The optical system also has a measuring structure constructed independently of the at least one load-dissipating structure.
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申请公布号 |
US2003010902(A1) |
申请公布日期 |
2003.01.16 |
申请号 |
US20020186600 |
申请日期 |
2002.07.01 |
申请人 |
CARL-ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG |
发明人 |
HOF ALBRECHT;MAUL GUENTER;MUEHLBEYER MICHAEL;MEHLKOPP KLAUS |
分类号 |
G02B7/182;G02B7/00;G02B7/02;G02B27/62;G03F7/20;G21K1/06;G21K5/02;H01L21/027;(IPC1-7):H01J3/14;H01J5/16 |
主分类号 |
G02B7/182 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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