发明名称 Optical system with a plurality of optical elements
摘要 An optical system, in particular an exposure lens for semiconductor lithography, with a plurality of optical elements has at least one load-dissipating structure. The load-dissipating structure diverts the forces originating from the optical elements. The optical system also has a measuring structure constructed independently of the at least one load-dissipating structure.
申请公布号 US2003010902(A1) 申请公布日期 2003.01.16
申请号 US20020186600 申请日期 2002.07.01
申请人 CARL-ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG 发明人 HOF ALBRECHT;MAUL GUENTER;MUEHLBEYER MICHAEL;MEHLKOPP KLAUS
分类号 G02B7/182;G02B7/00;G02B7/02;G02B27/62;G03F7/20;G21K1/06;G21K5/02;H01L21/027;(IPC1-7):H01J3/14;H01J5/16 主分类号 G02B7/182
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