发明名称 |
Method and apparatus for leak detecting, and apparatus for semiconductor manufacture |
摘要 |
Components of sampled gases are analyzed by a Fourier transform infrared spectrophotometer 28. It is determined whether or not the analyzed gases include at least one kind of specific gases equal to or more than a predetermined quantity. In a case where mixed gases include at least one kind of the specific gases equal to or more than the predetermined quantity, a controller 30 supplies an operation display monitor 31 with a signal indicating leakage of the kind of the specific gases. Hence, it is possible to realize detection by kind of the gases with high accuracy irrespective of the kind of leaked gas. |
申请公布号 |
US2003010918(A1) |
申请公布日期 |
2003.01.16 |
申请号 |
US20020204322 |
申请日期 |
2002.08.21 |
申请人 |
KOMIYAMA KIYOSHI;WATANABE SHINICHI;GOTODA KAZUNORI |
发明人 |
KOMIYAMA KIYOSHI;WATANABE SHINICHI;GOTODA KAZUNORI |
分类号 |
G01N21/35;(IPC1-7):G01N21/35 |
主分类号 |
G01N21/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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