发明名称 PROJECTION OPTICAL SYSTEM AND EXPOSURE DEVICE HAVING THE PROJECTION OPTICAL SYSTEM
摘要 A projection optical system having six reflectors (CM1 to CM6) and forming the reduced image of an image on a first surface (4) on a second surface (7), comprising a first reflection imaging optical system (G1) for forming an intermediate image of the image on the first surface and a second reflection imaging optical system (G2) for forming the image of the intermediate image on the second surface, wherein the first reflection imaging optical system further comprising a pair of convex reflectors (CM2, CM3) disposed opposedly to each other.
申请公布号 WO03005097(A1) 申请公布日期 2003.01.16
申请号 WO2002JP05532 申请日期 2002.06.05
申请人 NIKON CORPORATION;TAKAHASHI, TOMOWAKI 发明人 TAKAHASHI, TOMOWAKI
分类号 G21K1/06;G02B17/00;G02B17/06;G02B17/08;G03F7/20;H01L21/027;(IPC1-7):G02B17/06 主分类号 G21K1/06
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