| 摘要 |
<p>A vapor-deposition process for depositing TiO2 and a vapor deposition process for depositing SiO2 are alternately repeated in a multi-layer film forming process. A refractive index that a thin film formed by each vapor-depositing will provide is individually determined prior to each relative vapor-depositing, and vapor-deposition control data is prepared based on such a refractive index. Each vapor-deposition is controlled by using a relative vapor-deposition control data thus prepared. Therefore, each vapor-deposition process can be accurately controlled according to the refractive index of a thin film even if repeated vapor-deposition processes change the refractive index. Accordingly, a multi-layer film having desired optical characteristics can be formed.</p> |
