METHOD OF SHALLOW TRENCH ISOLATION USING A SINGLE MASK

摘要

A method of shallow trench isolation includes preparing a substrate, including forming mesa structures thereon; forming a barrier cap on the mesa structures; forming an oxide multi-layer structure over the mesas and barrier caps, including: depositing a first oxide layer having a conventional polishing rate; depositing a second oxide layer having a low polishing rate; and depositing a third oxide layer having a conventional polishing rate; and polishing the structure to the level of the barrier cap.