A semiconductor laser device having two active layer stripe structures. A cross section of one of the stripe structures includes an n−InP substrate (1), n−InP clad layer (2), a lower GRIN−SCH layer (3b), an active layer (4b), an upper GRIN−SCH layer (5b), a p−InP clad layer (6), and a p−InGaAsP contact layer (7) formed in this order. Moreover, a high reflection film (12) is arranged at the reflection side end surface and a low reflection film (13) is arranged at the emission side end surface. On the p−InGaAsP contact layer (7), a p−side electrode (8b) is arranged partly and a non−current poured region (14) is formed at the remaining area.
申请公布号
WO03005514(A1)
申请公布日期
2003.01.16
申请号
WO2002JP05791
申请日期
2002.06.11
申请人
THE FURUKAWA ELECTRIC CO., LTD;YOSHIDA, JUNJI;TSUKIJI, NAOKI;KIMURA, TOSHIO;NAKAE, MASASHI;AIKIYO, TAKESHI