发明名称 Semiconductor device and method for producing same
摘要 A semiconductor device having a substrate, an insulating film formed in the substrate, a conductive layer formed on the insulating film and having at least a part in contact with the insulating film made of a conductive material having a work function near a substantial center of an energy band gap of the substrate material and containing a predetermined amount of impurity, and a takeout electrode formed in the substrate and a method for producing the same.
申请公布号 US2003011035(A1) 申请公布日期 2003.01.16
申请号 US20020150974 申请日期 2002.05.21
申请人 KOMATSU HIROSHI 发明人 KOMATSU HIROSHI
分类号 H01L29/78;H01L21/28;H01L29/423;H01L29/43;H01L29/49;(IPC1-7):H01L31/119 主分类号 H01L29/78
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