发明名称 |
Chemical amplification type positive resist composition |
摘要 |
A chemical amplification type positive resist composition that enables a resist pattern free from deformation in a side wall thereof and excellent in evenness and is excellent in sensitivity as well as resolution is provided and the chemical amplification type positive resist composition comprises a resin which has a polymerization unit derived from p-hydroxystyrene and a polymerization unit having a group unstable against acid, and is insoluble or hardly soluble in an alkaline medium itself but becoming alkaline-soluble after the acid-unstable group being cleaved by the action of the generated acid; an acid generating agent; and a compound represented by the following formula (I): wherein R1 and R2 each independently represents an alkyl group having 1 to 15 carbon atoms, an alkyl group having 1 to 8 carbon atoms wherein at least 3 hydrogen atoms are substituted by fluorine atoms, or an aryl group having 6 to 10 carbon atoms,
|
申请公布号 |
US2003013038(A1) |
申请公布日期 |
2003.01.16 |
申请号 |
US20020107488 |
申请日期 |
2002.03.28 |
申请人 |
ICHIMURA KUNIHIRO;OKUDAIRA TSUGIO;SUETSUGU MASUMI;UETANI YASUNORI;NAMBA KATSUHIKO |
发明人 |
ICHIMURA KUNIHIRO;OKUDAIRA TSUGIO;SUETSUGU MASUMI;UETANI YASUNORI;NAMBA KATSUHIKO |
分类号 |
G03F7/039;C08F212/14;C08F220/12;G03F7/004;H01L21/027;(IPC1-7):G03F7/038 |
主分类号 |
G03F7/039 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|