发明名称 |
Positive photosensitive compositions |
摘要 |
A positive photosensitive composition comprising (A) a compound capable of generating a fluorine-substituted alkanesulfonic acid having 2 to 4 carbon atoms by irradiation of actinic rays or radiation, (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and being decomposed by the action of an acid to increase solubility in an alkali developer, (C) a basic compound, and (D) a fluorine and/or silicon surfactant.
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申请公布号 |
US2003010748(A1) |
申请公布日期 |
2003.01.16 |
申请号 |
US20020095086 |
申请日期 |
2002.03.12 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KODAMA KUNIHIKO;AOAI TOSHIAKI |
分类号 |
C08K5/02;C08K5/16;C08K5/42;C08K5/54;C08L101/00;C23F1/02;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):C23F1/00;C03C25/68 |
主分类号 |
C08K5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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