发明名称 Self-aligning wafer burn-in probe
摘要 The material and geometric properties of an electrical probe contact are combined to produce an electrical contact which is capable of self-alignment over many thousands of uses. The probe contact moves substantially only in a vertical direction and provides a consistent contact force with corresponding electrical contact pads on a semiconductor wafer. The probe contacts are configured in an array of a large plurality of individual contacts which extend from a base to which they are attached through apertures in an overlying mask spaced apart from the base.
申请公布号 US2003011394(A1) 申请公布日期 2003.01.16
申请号 US20010902964 申请日期 2001.07.11
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 NOTOHARDJONO BUDY D.;SCHMIDT ROGER R.
分类号 G01R1/067;G01R1/073;G01R31/28;H01L21/66;(IPC1-7):G01R31/02 主分类号 G01R1/067
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