发明名称 |
Dangerous process/pattern detection system and method, danger detection program, and semiconductor device manufacturing method |
摘要 |
A system for detecting dangerous process/pattern includes: an input data processing unit configured to convert input data into formatted data; a critical condition storage unit configured to store critical conditions for defect generation; a universal simulation unit configured to perform at least process simulation for the formatted data and output those result as dangerous process determination-formatted data; and a mask simulation unit configured to perform mask simulation for the formatted data and output those result as dangerous pattern determination-formatted data. In addition, the system includes a dangerous process determination unit configured to compare the dangerous process determination-formatted data and the critical conditions, and determine whether it is a dangerous process; and a dangerous pattern determination unit configured to compare the dangerous pattern determination-formatted data and the critical conditions, and determine whether or not it is a dangerous pattern.
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申请公布号 |
US2003014146(A1) |
申请公布日期 |
2003.01.16 |
申请号 |
US20020193215 |
申请日期 |
2002.07.12 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
FUJII OSAMU;AKIYAMA TATSUO |
分类号 |
G05B23/02;(IPC1-7):G06F19/00 |
主分类号 |
G05B23/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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