| 摘要 |
<p>Pure water (3) with a resistivity of 1 M OMEGA .cm or more is externally supplied in an exposure apparatus in which a master and substrate are relatively moved and aligned by a stage driven by a linear motor (1) and a pattern on the master is transferred onto the substrate. While being adjusted to a predetermined temperature, the pure water (3) undergoes deoxidation processing and UV sterilization processing and is circulated to cool the linear motor (1). <IMAGE></p> |
