| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical amplification type positive type photoresist composition excellent in various characteristics such as resolving power, margin for exposure, edge roughness of a pattern and density dependence. SOLUTION: The positive type photoresist composition contains (A) at least two photo-acid generators which are selected from sulfonates in which each of cationic moieties comprises iodonium or sulfonium and each of anionic moieties comprises an anion of the formula RFSO3 <-> (where RF is a 1-20C fluorine substituted alkyl group), have a difference between the numbers of carbon atoms in the groups RF of the anionic moieties in the range of 2-15 and generate acids when irradiated with active light or radiation and (B) a resin which contains specified repeating units and is decomposed by the action of the acids to increase its alkali solubility. |
