摘要 |
<p>PROBLEM TO BE SOLVED: To sensitively discover a water leak in a water-cooled reaction vessel having a means for introducing reactive gas reacting with water to generate hydrogen chloride into the reaction vessel, and discharging the internal gas in the reaction vessel to the outside like a CDV reaction furnace used for manufacturing polycrystalline silicon. SOLUTION: Exhaust gas is sampled from the outlet piping 3 of the water- cooled reaction vessel, and the concentration of hydrogen chloride in the sampled exhaust gas is measured by infrared spectral analysis. The water leak into the water-cooled reaction vessel is detected from a sudden rise of the measured value.</p> |