POSITIVE TYPE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive type resist composition suitable for use under a light source for exposure which emits light of <=160 nm, particularly F2 excimer laser light (157 nm) and specifically to provide a positive type resist composition exhibiting satisfactory transmittance when a light source which emits light of 157 nm is used and having good contrast by dissolution. SOLUTION: Each of the positive type resist compositions contains (A) a resin which has repeating units with a specified structure and is decomposed by the action of an acid to increase its solubility in an alkali developing solution, (B) a compound which generates the acid when irradiated with active light or radiation and (C) a solvent.