APPARATUS FOR HEATING VIEW PORT OF SEMICONDUCTOR FABRICATION EQUIPMENT

摘要

PURPOSE: An apparatus for heating a view port of semiconductor fabrication equipment is provided to prevent a polymer generated from non-reacted gases in an etching process by using a heating portion for heating the view port. CONSTITUTION: An etch chamber(10) is used for forming plasma in an etching process. A view port quartz(12) transmits wavelength of the plasma generated from the etch chamber(10). An EPD(End Point Detection) cable(14) is connected with the view port quartz(12) in order to transmit the wavelength of the plasma. A heating portion(18) is installed at the view port quartz(12) in order to prevent a polymer adhered on the view port quartz(12) by heating the view port quartz(12). AN EPD controller(16) is used for reading the wavelength of the plasma transmitted from the EPD cable(14) and calculating correctly an etching time.