PHOTOSENSITIVE COMPOSITION AND METHOD FOR MANUFACTURING ARTICLE COVERED WITH PATTERNED FILM

摘要

PROBLEM TO BE SOLVED: To manufacture an article covered with a patterned film which can be formed by short-time irradiation with light followed by development with high sensitivity and has superior pattern accuracy. SOLUTION: In the method for manufacturing an article covered with a patterned film, a substrate is coated with a photosensitive composition containing a metal alkoxide and β-diketone, the resulting coating film is patternwise irradiated with light, the exposed area of the coating film is polymerized and the unexposed area is dissolved and removed. The photosensitive composition further contains acrylic acid or methacrylic acid besides the metal alkoxide and β-diketone.