| 摘要 |
PROBLEM TO BE SOLVED: To provide a device for vaporizing/feeding a liquid raw material, which feeds vapor with steady volume as a source gas, into a reaction chamber such as a CVD apparatus. SOLUTION: This device comprises arranging a vessel 1 for accommodating, heating, and vaporizing a liquid raw material 2, and a carrier-gas feed pipe 4 which is inserted in and connected with the vessel 1 and is installed so that the bottom end opening 4a thereof is located at a higher position than a liquid level 2a of the above liquid raw material 2, and leading a gas G generated by vaporization of the above liquid raw material 2, to the outside of the vessel 1, with a carrier gas CG fed through the carrier-gas feed pipe 4.
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