POLISHING METHOD AND POLISHING DEVICE, EXPOSURE DEVICE, DEVICE MANUFACTURING METHOD AND DEVICE THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a polishing method and a polishing device capable of polishing a workpiece made of a crystal material having different unit removal amounts depending on position into a desired shape, an exposure device, a device manufacturing method and a device. SOLUTION: This method for polishing the workpiece made of the crystal material into a desired facial shape by scanning and moving a polishing tool sufficiently small for the workpiece on the workpiece comprises a step for obtaining an average inclination angle of a contact plane at points in polishing regions of the workpiece and a step for changing polishing conditions in accordance with the average inclination angle obtained in the angle acquisition step.