| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition developable with an aqueous alkali solution and having positive type pattern forming ability and to provide a new positive type pattern forming method. SOLUTION: The positive type photosensitive resin composition comprises (A) a photosensitive polymer of formula (1) (where R<1> is a tetravalent aromatic group; R<2> is a divalent aromatic group; and (k), (m) and (n) are each an integer of >=1), (B) a bior higher functional vinyl ether compound, (C) a photo-acid generator which changes into an acidic compound under active light such as UV and (D) a solvent. The positive type pattern forming method uses the composition. |
