发明名称 |
CRYSTAL GROWTH METHOD |
摘要 |
PROBLEM TO BE SOLVED: To prevent a first dislocation generation of a pulled crystal caused by applying voltage between the pull shaft and the raw material melt. SOLUTION: The voltage applied between the pull shaft 3 and the raw material melt is kept at >=-50 V and <=+50 V at least during the time when the seed crystal 11 touches the raw material melt 10 and the formation of a crystal body is completed. Preferably a voltage of -50 to 0 V is applied to the pull shaft 3 and the raw material melt 10 is grounded.
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申请公布号 |
JP2003012393(A) |
申请公布日期 |
2003.01.15 |
申请号 |
JP20010193359 |
申请日期 |
2001.06.26 |
申请人 |
SUMITOMO MITSUBISHI SILICON CORP |
发明人 |
KUBO TAKAYUKI;KAWAHARA KENJI;TOMA KOJI;MINAMI MORIO |
分类号 |
C30B15/00;C30B29/06;(IPC1-7):C30B15/00 |
主分类号 |
C30B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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