发明名称 CRYSTAL GROWTH METHOD
摘要 PROBLEM TO BE SOLVED: To prevent a first dislocation generation of a pulled crystal caused by applying voltage between the pull shaft and the raw material melt. SOLUTION: The voltage applied between the pull shaft 3 and the raw material melt is kept at >=-50 V and <=+50 V at least during the time when the seed crystal 11 touches the raw material melt 10 and the formation of a crystal body is completed. Preferably a voltage of -50 to 0 V is applied to the pull shaft 3 and the raw material melt 10 is grounded.
申请公布号 JP2003012393(A) 申请公布日期 2003.01.15
申请号 JP20010193359 申请日期 2001.06.26
申请人 SUMITOMO MITSUBISHI SILICON CORP 发明人 KUBO TAKAYUKI;KAWAHARA KENJI;TOMA KOJI;MINAMI MORIO
分类号 C30B15/00;C30B29/06;(IPC1-7):C30B15/00 主分类号 C30B15/00
代理机构 代理人
主权项
地址