发明名称 DEVICE FOR CALIBRATING STACK ELEMENTS, METHOD FOR MANUFACTURING THE SAME AND METHOD FOR MEASURING HIGH FREQUENCY CHARACTERISTICS BY USING THE SAME
摘要 PURPOSE: A device for calibrating stack elements, a method for manufacturing the same and a method for measuring a high frequency characteristics by using the same are provided to eliminate the effect of a via hole and accurately measure a high frequency characteristic by making the structure which is similar to an object to be measured. CONSTITUTION: A device(300) for calibrating stack elements includes an impedance pattern layer located at the same height of an incorporated device to be measured and printed thereon an impedance pattern(310) to performing the calibration of the incorporated device, a via hole layer stacked on the impedance pattern layer and having the same height of a via hole(320) of the incorporated device and a plurality of conductive pads(330) stacked on the via hole layer and connected to the impedance pattern(310) through the via hole(320), wherein the device(300) is calibrated to the impedance pattern(310) corresponding to the position of the incorporated device by contacting a measurement device to perform the calibration at the conductive pads(330).
申请公布号 KR20030004474(A) 申请公布日期 2003.01.15
申请号 KR20010039967 申请日期 2001.07.05
申请人 KOREA ELECTRONICS TECHNOLOGY INSTITUTE 发明人 CHO, HYEON MIN;LEE, U SEONG;PARK, JONG CHEOL;PARK, SEONG DAE
分类号 G01R27/28;(IPC1-7):G01R27/28 主分类号 G01R27/28
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