RAPID THERMAL PROCESSING APPARATUS

摘要

PURPOSE: A rapid thermal processing apparatus is provided to decrease an interval of time for heating a wafer and reduce thermal budget of the wafer by making the center of a lamp window become a shape of a convex lens. CONSTITUTION: A semiconductor substrate is heated by an infrared lamp(260) of the rapid thermal processing apparatus. The rapid thermal processing apparatus includes the lamp window(250) whose center portion is like a convex lens. The infrared lamp and the lamp window are positioned under the semiconductor substrate. The infrared lamp is a halogen lamp. The lamp window is composed of quartz.