APPARATUS AND METHOD FOR CLEANING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus in which the ozone water used once for cleaning a substrate can be reused and batch processing can be carried out by using high-concentration ozone water. SOLUTION: This substrate cleaning apparatus has at least an ozone dissolving module for carrying out a step to dissolve ozone gas in water and a reaction tank for carrying out a step to clean the substrate with ozone water. A gas dissolving membrane consisting of a non-porous membrane is housed in the ozone dissolving module. The ozone water is circulated between the reaction tank and the ozone dissolving module.