发明名称 Semiconductor testing equipment with probe formed on a cantilever of a substrate
摘要 The conventional semiconductor element testing equipment is arranged to position each probe accurately and need a burdensome operation for fixing, and includes only a limited number of electrode pads and chips to be tested at a batch. An equipment for testing a semiconductor element is arranged to keep each of electrode pads formed on a semiconductor element to be tested in direct contact with each of probes formed on a first substrate composed of silicon, one of electric connecting substrates disposed in the equipment. On the first substrate, each probe is formed on a cantilever and a wire is routed from a tip of each probe along a tip of the cantilever to the electrode pad formed on an opposite surface to the probe forming surface through an insulating layer.
申请公布号 US6507204(B1) 申请公布日期 2003.01.14
申请号 US20000522477 申请日期 2000.03.09
申请人 HITACHI, LTD. 发明人 KANAMARU MASATOSHI;ENDO YOSHISHIGE;HOSOGANE ATSUSHI;NAGATA TATSUYA;KOHNO RYUJI;AOKI HIDEYUKI;ARIGA AKIHIKO
分类号 G01R1/073;G01R1/067;G01R3/00;G01R31/02;H01L21/66;(IPC1-7):G01R31/02 主分类号 G01R1/073
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