发明名称 PROCESSING APPARATUS AND PROCESSING SYSTEM FOR SEMICONDUCTOR DEVICE
摘要 A manufacturing apparatus (13) of a semiconductor device includes an introducing section (13-1), a process section, and a withdrawing section (13-2). The introducing section (13-1) introduces a transfer box therein. The process section takes in the semiconductor substrate put in the introducing section and applies a prescribed processing to the semiconductor substrate. Further, the withdrawing section (13-2) is arranged on a surface differing from the surface on which the introducing section (13-1) is arranged and discharges the transfer box holding the semiconductor substrate withdrawn from the process section of the semiconductor substrate. <IMAGE>
申请公布号 KR20030004441(A) 申请公布日期 2003.01.14
申请号 KR20027016067 申请日期 2002.03.26
申请人 发明人
分类号 H01L21/02;H01L21/302;H01L21/00;H01L21/027;H01L21/3065;H01L21/31;H01L21/677 主分类号 H01L21/02
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