发明名称 |
Vapor deposition chamber components and methods of making the same |
摘要 |
The present invention provides a method of reducing or delaying the exfoliation of deposited films within a vapor deposition system. The method of preventing the delamination of thin films deposited of a vapor deposition chamber components includes the steps of depositing a series of thin films on a discontinuous surface. The internal stress of the deposited thin film laminates are relaxed by fragmenting the deposited thin film laminates into a plurality of discontinuous surfaces. Thus allowing the exfoliation process of the thin film laminates to be delayed.
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申请公布号 |
US6506312(B1) |
申请公布日期 |
2003.01.14 |
申请号 |
US19990299550 |
申请日期 |
1999.04.26 |
申请人 |
BOTTOMFIELD ROGER L. |
发明人 |
BOTTOMFIELD ROGER L. |
分类号 |
C23C14/00;C23C14/56;C23C16/44;C23F1/02;H01J37/32;(IPC1-7):B44C1/22 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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