发明名称 Vapor deposition chamber components and methods of making the same
摘要 The present invention provides a method of reducing or delaying the exfoliation of deposited films within a vapor deposition system. The method of preventing the delamination of thin films deposited of a vapor deposition chamber components includes the steps of depositing a series of thin films on a discontinuous surface. The internal stress of the deposited thin film laminates are relaxed by fragmenting the deposited thin film laminates into a plurality of discontinuous surfaces. Thus allowing the exfoliation process of the thin film laminates to be delayed.
申请公布号 US6506312(B1) 申请公布日期 2003.01.14
申请号 US19990299550 申请日期 1999.04.26
申请人 BOTTOMFIELD ROGER L. 发明人 BOTTOMFIELD ROGER L.
分类号 C23C14/00;C23C14/56;C23C16/44;C23F1/02;H01J37/32;(IPC1-7):B44C1/22 主分类号 C23C14/00
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