发明名称 NON-VOLATILE SEMICONDUCTOR MEMORY AND MANUFACTURING T METHOD THEREFOR
摘要 PURPOSE: To provide a non-volatile semiconductor memory having a structure which relaxes the difficulty in reducing the resistance of wiring which accompanies micronization of the non-volatile semiconductor memory. CONSTITUTION: The non-volatile semiconductor memory comprises a memory cell transistor of stack gate type. The control gate of the memory cell transistor comprises a metal 29 embedded in a groove 25.
申请公布号 KR20030004035(A) 申请公布日期 2003.01.14
申请号 KR20020035740 申请日期 2002.06.25
申请人 发明人
分类号 H01L21/3205;H01L21/76;H01L21/762;H01L21/8247;H01L23/52;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L27/115 主分类号 H01L21/3205
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