发明名称 |
NON-VOLATILE SEMICONDUCTOR MEMORY AND MANUFACTURING T METHOD THEREFOR |
摘要 |
PURPOSE: To provide a non-volatile semiconductor memory having a structure which relaxes the difficulty in reducing the resistance of wiring which accompanies micronization of the non-volatile semiconductor memory. CONSTITUTION: The non-volatile semiconductor memory comprises a memory cell transistor of stack gate type. The control gate of the memory cell transistor comprises a metal 29 embedded in a groove 25.
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申请公布号 |
KR20030004035(A) |
申请公布日期 |
2003.01.14 |
申请号 |
KR20020035740 |
申请日期 |
2002.06.25 |
申请人 |
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发明人 |
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分类号 |
H01L21/3205;H01L21/76;H01L21/762;H01L21/8247;H01L23/52;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L27/115 |
主分类号 |
H01L21/3205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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