ELECTROSTATIC CHUCK AND SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

PROBLEM TO BE SOLVED: To obtain an electrostatic chuck which has high performance and excellent durability, by preventing deterioration caused by etching of an insulating organic polymer film. SOLUTION: A metallic film electrode 2 is coated with a resin 3 whose main component is vinylidene fluoride and an exposed surface part of the resin film is covered with polytetrafluoroethylene 4. The polytetrafluoroethylene 4 is not etched by fluorine gas ion and radical, and does not produce pinholes because it has low melting point caused by low molecular weight.