STENCIL MASK, ITS MANUFACTURING METHOD AND EXPOSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a stencil mask exhibiting excellent electron beam irradiation characterstics in which a thin film can be deposited easily while controlling stress. SOLUTION: The stencil mask comprises a basic body and a parent material of mask supported by the basic body wherein the parent material of mask comprises a thin film principally comprising carbon and having a through hole pattern passing a charged particle beam.