| 摘要 |
PROBLEM TO BE SOLVED: To improve the throughput of substrate treatment, and at the same time, to suppress the quality variations among substrates. SOLUTION: A substrate-treating device is provided with a coating section 1, a developing section 2, a heat treating section, a transfer mechanism 4, etc. The coating section 1 is provided with a first treatment unit 5 which covers the surface of substrates W with a photoresist liquid by supplying the liquid to the surfaces of the substrates W and a second treatment unit 6, which makes the photoresist liquid smaller in thickness by rotating the covered substrates W at a high speed and, at the same time, dries the formed photoresist films and cleans the substrates W. Since all the substrates W are treated under the same coating condition, the quality variation among the substrates W is suppressed. In addition, since the treatment units 5 and 6 perform treatment in parallel with each other, the throughput of substrate treatment can be improved. |
