SUBSTRATE PROVIDED WITH ALIGNMENT MARK, METHOD OF DESIGNING MASK, COMPUTER, PROGRAM, MASK FOR EXPOSING THE MARK, METHOD OF MANUFACTURING DEVICE, AND DEVICE MANUFACTURED BY THE METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate provided with an alignment mark in a substantially transmissive process layer overlying the substrate. SOLUTION: The alignment mark contains at least one relatively high- reflectance area for reflecting radiation of an alignment beam of radiation and relatively low reflectance areas for reflecting less radiation of the alignment beam. The high-reflectance area is segmented in both first and second directions, which are substantially perpendicular to each other, so that the high reflectance area comprises predominantly rectangular segments.