LITHOGRAPHIC PROJECTION SYSTEM, METHOD OF MANUFACTURING ELEMENT, AND ELEMENT MANUFACTURED BY THE METHOD

摘要

PROBLEM TO BE SOLVED: To remove unwanted contaminants generated by a radiation source. SOLUTION: Contaminant particles which move together with a projected beam are ionized. A purge gas can be attracted toward a gettering plate provided on the upstream of a purge gas supply source. The ionization of the purge gas is improved, by enclosing electrons generated by an ionizing device by means of a magnetic field. The contaminant particles can be ionized, by generating a plasma in a pipe having a larger length than its width.