发明名称 HIGH-FREQUENCY PLASMA DISCHARGE APPARATUS
摘要 PROBLEM TO BE SOLVED: To realize a high-frequency plasma discharge apparatus, which is capable of improving a reaction product eliminating plasma discharge in efficiency and reducing gas consumption. SOLUTION: A plasma discharge tube (discharge tube) 11 is installed inside a reaction processing chamber 1, penetrating through the wall of the processing chamber 1. The discharge tube 11 is reduced in pressure through insulating dielectric tube active seed discharge capillaries 24 by reducing the reaction processing chamber 1 in pressure through evacuation, deposit-removing processing gas is introduced through a removing gas inlet 8, high-frequency power is supplied from a discharge tube high-frequency power source 12 to the discharge tube 11 via a power supply-side matching unit 13, an electric discharge occurs in the discharge tube 11 to turn the deposit removing gas into a plasma, gas decomposition active seeds are discharged out into the reaction processing chamber 1, the deposits are decomposed into volatile matter, and the volatile matter is evacuated through an evacuation system 6.
申请公布号 JP2003007628(A) 申请公布日期 2003.01.10
申请号 JP20010222283 申请日期 2001.06.18
申请人 TAKAMATSU TOSHIYUKI 发明人 TAKAMATSU TOSHIYUKI
分类号 H05H1/46;B01J19/08;C23C16/44;H01L21/205;H01L21/302;H01L21/3065 主分类号 H05H1/46
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