| 摘要 |
PURPOSE: An apparatus of chemical vapor deposition for processing semiconductor is provided to measure a position and state of a shower head and protect the shower head from defects and powders in a cleaning process. CONSTITUTION: The apparatus of chemical vapor deposition comprises a process chamber(10) for chemical reaction, a shower head(30) for injecting a gas onto a wafer, a gas inlet(20) for gas supply, a heat block(40), a cover(50) of the shower head, a measuring unit(60) for the state of the shower head.
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