| 摘要 |
PURPOSE: A wet etch apparatus for fabricating a semiconductor wafer is provided to remove a loss of a pump by forming an absorbing body and an absorbing fixing guide with one body. CONSTITUTION: A wet etch apparatus(10) is formed with a chemical tank(20), a supply tube(30), a supplement tube(40), a pump(100), and a chemical vessel(50). The chemical tank(20) is used for storing chemicals supplied from a chemical supply room. The supply tube(30) is used for connecting the chemical tank(20) with the chemical vessel(50). The chemicals of the chemical tank(20) are supplied to the chemical vessel(50) through the supply tube(30) according to a programmed time schedule of a control device. The pump(100) is located on a path of the supplement tube(40) in order to supplement the chemicals into the chemical vessel(50) and control density of the chemical vessel(50).
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