发明名称 CHUCKING APPARATUS FOR DRYING CLEANED SUBSTRATE
摘要 PURPOSE: A chucking apparatus for drying a cleaned substrate is provided to improve drying efficiency of the cleaned substrate in a drying room by performing smoothly a drying process after performing a cleaning process. CONSTITUTION: A pinion(2) is rotated by a shaft(2-1). A couple of racks(3,4) are combined with an upper side and a lower side of the pinion(2). A guide block(17-1) is foxed on the rack(3). A guide block(17-2) is slid along the guide rail(17-1) of the upper side of rack(3). A rod of a lossless cylinder(16) is fixed to the rack(4). A long operating arm(5) and a short operating arm(6) are fixed to each front end portion of the racks(3,4). The operating arms(5,6) are maintained in a horizontal state by a support portion(18). A chucking jig(10) is loaded into an inner face of a short chucking arm. The chucking jigs(10,11) are loaded into an upper side and a lower end of a long chucking arm(8).
申请公布号 KR20030003515(A) 申请公布日期 2003.01.10
申请号 KR20010039409 申请日期 2001.07.03
申请人 K.C. TECH CO., LTD. 发明人 OH, JUN HYEOK
分类号 H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/68
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