| 摘要 |
PROBLEM TO BE SOLVED: To prevent the cost increase of an exposure system, when many autofocus sensors are arranged, and to prevent the following-up accuracy of a stage from deteriorating by the abrupt variations in a correction amount, resulting from the wrong measurement of a sensor. SOLUTION: The exposure system performs scanning exposure, by adjusting the alignment and height of a substrate 107 based on the detected results of alignment marks, with respect to an exposure area on the substrate 107 and the results of autofocus measurement and projecting the pattern of raw glass 103 onto the substrate 107 while moving the glass 103 and substrate 107, with respect to a projection optical system 106. In this exposure system, a sensor 115 for autofocus is provided at a position where the sensor 115 performs the autofocus measurement when the substrate 107 is moved for the detection of the alignment marks. Of the measured values of the autofocus measurement, those which go out of a prescribed permitted limit are not used for the height adjustment of the substrate 107. |
