发明名称 |
Method and apparatus for fluid flow control |
摘要 |
The invention provides a method and apparatus to control fluids such as process gases into two or more substrate process chambers. In one aspect, the gas flow from a first supply to a first processing region is used to control the gas flow of a second supply to a second processing region where the total gas flow is about equal to the total of the gas flows into both the first and second processing regions. In another aspect, the gas flow rate from the first supply for the first processing region is about equal to the gas flow rate for the second supply to the second processing region.
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申请公布号 |
US2003005958(A1) |
申请公布日期 |
2003.01.09 |
申请号 |
US20010895104 |
申请日期 |
2001.06.29 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ROCHA-ALVAREZ JUAN CARLOS;CHEN CHEN-AN;VENKATARAMAN SHANKAR |
分类号 |
G05D7/06;(IPC1-7):G05D11/00 |
主分类号 |
G05D7/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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