发明名称 SUBSTRATE CONTAINER, SUBSTRATE CONVEYING SYSTEM AND GAS REPLACEMENT METHOD
摘要 PURPOSE: To replace atmosphere within an entire substrate container efficiently in a short time. CONSTITUTION: Deflection means for deflecting the inflow of gas is provided so as to flow gas into the substrate container from a gas inset provided in the substrate container, which is capable of containing the substrate, and replace an atmosphere within the substrate container.
申请公布号 KR20030002996(A) 申请公布日期 2003.01.09
申请号 KR20020029446 申请日期 2002.05.28
申请人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. 发明人 TOKUNAGA KENJI
分类号 B65D47/06;B65D85/86;H01L21/673;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65D47/06
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