| 摘要 |
PURPOSE: A fabrication method of an image sensor is provided to improve optical transmittance by planarizing the image sensor using photoresist without using an OCL(Over Coating Layer) having low optical transmittance. CONSTITUTION: A color filter(2) is formed on a substrate having a lower layer(1). The first photoresist layer(5) for planarization is coated on the color filter(2) and patterned. The second photoresist layer(6) for micro lens is coated on the resultant structure and patterned. By flowing the second and first photoresist layer(5,6) using thermal processing, a dome-shaped micro lens is then formed.
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