Strahlenabbildungssystem mit mehrfacher Lichtfleckgrösse und Verfahren,申请号DE19986009627-传众专利搜索

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发明名称	Strahlenabbildungssystem mit mehrfacher Lichtfleckgrösse und Verfahren
摘要
申请公布号	DE69809627(D1)	申请公布日期	2003.01.09
申请号	DE19986009627	申请日期	1998.03.30
申请人	AGFA CORP., RIDGEFIELD PARK	发明人	KELLEY, HENRY A.;MASON, STEVEN E.
分类号	G02B26/10;G02B26/00;G02B27/00;H04N1/04;H04N1/06;H04N1/113;(IPC1-7):G02B27/09;G02B7/10;B41J2/445;B41B21/16;H04N1/23	主分类号	G02B26/10
代理机构		代理人
主权项
地址

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