发明名称 |
Semiconductor device, method of measuring the same, and method of manufacturing the same |
摘要 |
Disclosed is a technique capable of improving a yield of a semiconductor device by measuring a plurality of TEGs arranged in a scribe region. A first electrode pad connected to each terminal of a TEG is formed as a rectangular, minute, isolated pattern having a side length of about 0.5 mum or shorter and constituted of an uppermost layer wiring on a semiconductor substrate, and therefore, a great number of TEGs can be laid in a first scribe region. The characteristic evaluation or the failure analysis is performed by contacting a nanoprobe having a tip radius of curvature of 0.05 mum to 0.8 mum to the first electrode pad.
|
申请公布号 |
US2003006795(A1) |
申请公布日期 |
2003.01.09 |
申请号 |
US20020051056 |
申请日期 |
2002.01.22 |
申请人 |
ASAYAMA KYOICHIRO;MITSUI YASUHIRO;ARAKAWA FUMIKO;KAMOHARA SHIRO;OHJI YUZURU |
发明人 |
ASAYAMA KYOICHIRO;MITSUI YASUHIRO;ARAKAWA FUMIKO;KAMOHARA SHIRO;OHJI YUZURU |
分类号 |
G01R31/28;H01L21/28;H01L21/3205;H01L21/66;H01L21/822;H01L23/52;H01L23/544;H01L27/04;(IPC1-7):G01R31/02 |
主分类号 |
G01R31/28 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|