发明名称 Semiconductor device, method of measuring the same, and method of manufacturing the same
摘要 Disclosed is a technique capable of improving a yield of a semiconductor device by measuring a plurality of TEGs arranged in a scribe region. A first electrode pad connected to each terminal of a TEG is formed as a rectangular, minute, isolated pattern having a side length of about 0.5 mum or shorter and constituted of an uppermost layer wiring on a semiconductor substrate, and therefore, a great number of TEGs can be laid in a first scribe region. The characteristic evaluation or the failure analysis is performed by contacting a nanoprobe having a tip radius of curvature of 0.05 mum to 0.8 mum to the first electrode pad.
申请公布号 US2003006795(A1) 申请公布日期 2003.01.09
申请号 US20020051056 申请日期 2002.01.22
申请人 ASAYAMA KYOICHIRO;MITSUI YASUHIRO;ARAKAWA FUMIKO;KAMOHARA SHIRO;OHJI YUZURU 发明人 ASAYAMA KYOICHIRO;MITSUI YASUHIRO;ARAKAWA FUMIKO;KAMOHARA SHIRO;OHJI YUZURU
分类号 G01R31/28;H01L21/28;H01L21/3205;H01L21/66;H01L21/822;H01L23/52;H01L23/544;H01L27/04;(IPC1-7):G01R31/02 主分类号 G01R31/28
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