| 摘要 |
<p>An optical waveguide Bragg grating fabrication apparatus comprises a light source providing ultra-violet(UV) light and optical means for adapting the light beam to form an interference pattern in a photosensitive optical waveguide. The interference pattern has a spatial intensity modulation along the length of the optical waveguide and thus providing an optical grating in the waveguide in the form of a refractive index modulation. The optical means comprises a movable non-uniform diffractive mask for dividing the optical beam in at least two beams and optical elements for collecting two or more of the light beams to interfere on the optical waveguide. The optical means comprises position control means for controlling the position of at least one mirror or lens. Corresponding methods and the use of a super-periodic diffractive mask in such fabrication are described.</p> |
