METHOD FOR FORMING CONTACT PLUG OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: A method for forming a contact plug of a semiconductor device is provided to prevent misalignment and to resolve a problem that a contact area is not opened by forming all contact line in a line shape. CONSTITUTION: All contact lines, such as source contacts(31) and drain contacts(32) are formed in a line shape. A photoresist pattern(33) is remained between the drain contacts(32), so that the drain contacts(32) are isolated from each other. A gate is formed at interface(34) between the source contact(31) and the drain contact(32). Exposing the surface of the gate, the source contact plug is isolated from the drain contact plug by the gate.