发明名称 Method for fabrication of a silicon photosensor array on a wafer and testing the same
摘要 A method of fabricating and a wafer having a plurality of photosensor Arrays thereon. And, a method of testing the wafer before the wafer is diced and assembled to form a Silicon photosensor Array which may be combined with other like photosensor arrays to form a full page width image sensor bar. The invention allows checking of every V-groove on every chip. An implanted or diffused region is placed across the V-groove, with electrical connections on both ends of the diffusion. If the V-groove is formed, the diffused region will be broken and the electrical path will be open. A deeper diffusion can be also used to check for incomplete V-grooves. If one end of the electrical path is tied to an existing I/O pad on the chip and the other end to ground, this path will have no effect on the input resistance if the V-groove is formed. There will be a small, but acceptable, increase in input capacitance. If the V-groove is not formed, the connection will appear as a short or high leakage on the chip input, which will fail the DC test on that I/O. Thus, existing DC tests can be used to check normal I/O integrity and V-groove process completion.
申请公布号 US2003008423(A1) 申请公布日期 2003.01.09
申请号 US20010829117 申请日期 2001.04.09
申请人 XEROX CORPORATION 发明人 HOSIER PAUL A.;TANDON JAGDISH C.
分类号 G01R31/28;(IPC1-7):H01L21/66;G01R31/26;H01L21/20 主分类号 G01R31/28
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