发明名称 |
SIDEWALL SPACER DEFINITION OF GATES |
摘要 |
A method of forming features on a semiconductor device uses sidewall spacers, and includes providing a sidewall template (210) having first (224) and second (228) sidewall regions. A spacer layer (212) of a spacer material is formed over the sidewall template (210). The spacer layer (212) is then etched in a first etch to remove a first region (222) of the spacer layer over the first sidewall region (224) while leaving a second region (226) of the spacer layer (212) over the second sidewall region (228). The spacer layer (212) is again etched in a second etch to for at least one sidewall spacer (234).
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申请公布号 |
WO03003436(A1) |
申请公布日期 |
2003.01.09 |
申请号 |
WO2002US02994 |
申请日期 |
2002.01.31 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
LUKANC, TODD, P.;LYONS, CHRISTOPHER, F. |
分类号 |
H01L21/28;(IPC1-7):H01L21/28 |
主分类号 |
H01L21/28 |
代理机构 |
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地址 |
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