THIN FILM FORMING METHOD AND THIN FILM FORMING EQUIPMENT AND VAPOR DEPOSITION SOURCE

摘要

PROBLEM TO BE SOLVED: To make a target material longer in life by forming thin films using the entire part of the exposure section of the target material. SOLUTION: The thin film forming equipment induces a trigger discharge between a trigger electrode 3 and the target material 1 in a reduced pressure atmosphere, generates an arc discharge between the target material 1 and an arc electrode 4 with the trigger discharge as a start and forms the thin film on a substrate 8 by irradiating the substrate 8 with the plasma generated on the outer peripheral surface of the target material 1 by the arc discharge. The one end side of the target material 1 is exposed more to the outer peripheral surface section on the substrate side than an insulating member 5 and the trigger electrode 3. The one end of the arc electrode 4 projects more to the substrate side than the exposed outer peripheral surface section of the target material 1 and a connected to terminal 9 of the arc power source for indicating the arc discharge is connected to the projected segment. The electric resistance value of the arranged electrode 4 is higher than the electric resistance value of the target material 1.